Single-Electron Transistor (SET) Process and Device Simulation Using SYSNOPSYS TCAD Tools

نویسندگان

  • Uda Hashim
  • Amiza Rasmi
چکیده

Simulation of semiconductor device fabrication and operation is important to the design and manufacture of integrated circuits because it provides insights into complex phenomena that cannot obtained through experimentation or simple analytic models. Process and device simulation is commonly using for the design of new very large scale integration (VLSI) devices and processes. Simulation programs serves as exploratory tools in order to gain better understanding of process and device physics. In this research, single-electron transistor (SET) is simulated using Synopsys TCAD simulation tools to improve device performance and reliability or to increase the yield. The Taurus Medici is utilized for SET device simulation and the SET process simulation is utilizing Taurus TSUPREM-4. In addition, the structure of SET device, the capacitance, power, resistance and charging energy of SET device were obtained from these simulations. Ultimately, the SET device is operated at room temperature operation (300K).

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

SOI based nanowire single-electron transistors: design, simulation and process development

One of the great problems in current large-scale integrated circuits is increasing power dissipation in a small silicon chip. Single-electron transistors which operate by means of oneby-one electron transfer, is relatively small and consume very low power and suitable for achieving higher levels of integration. In this research, the four masks step are involved namely source and drain mask, Pol...

متن کامل

The Analysis of Coulomb Blockade in Fullerene Single Electron Transistor at Room Temperature

The Graphene based single electron transistor (SET) as a coulomb blockade device need to be explored .It is a unique device for high-speed operation in a nano scale regime. A single electron transfers via the coulomb barriers, but its movement may be prevented by coulomb blockade, so its effect is investigated in this research. The conditions of coulomb blockade and its controlling factors such...

متن کامل

Modeling and Simulation of a Molecular Single-Electron Transistor

In this paper, to understand the concept of coupling, molecule density of states that coupled to the metal electrodes will be explained then, based on this concept, a weak and strong coupling for the molecules attached to the metal electrodes will be described. Capacitance model is used to explore the connection of addition energy with the Electron affinity and the ionization energy of the mole...

متن کامل

TCAD based development of a polysilicon emitter transistor in a BiCMOS technology

Continuing advances in silicon integrated circuit technology lead to todays very large scale integrated circuits with several millions of transistors per single chip. High density and low power consumption advantage made CMOS technology to the leading silicon fabrication technology. Over the last decade the demand for higher speed and better analog circuit gave rise to the BiCMOS technology, wh...

متن کامل

The IC Processes of the Future Advances in Device Structures and Device Simulation Techniques

The state of the art of Technology Computer-Aided Design (TCAD) frameworks for the development of new device structures and their fabrication processes is discussed. A framework must contain support for both integration of existing simulation programs and development of new tools. The complexity and scope of a rigorous TCAD framework requires special effort to create a system which is comprehen...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2006